North America Photoresist and Photoresist Ancillaries Market Growth and Forecast by 2027

The North America photoresist and photoresist ancillaries market was valued at US$ 666.7 million in 2018 and is expected to grow at a CAGR of 6.0% during 2019–2027 to reach US$ 1,128.5 million by 2027.

Photoresists are light-sensitive polymeric resins mainly used in the production of printed circuit boards, printing plates, flat-panel liquid crystal displays, magnetic recording heads, and micro electromechanical systems (MEMS). These components serve as masking materials for the transfer of images into an underlying substrate via etching processes. Photoresist ancillaries are materials such as photoresist strippers, anti-reflective coatings, developers, and edge bead removers used along with photoresist. The photoresists and photoresist ancillaries are used in wiring configuration of multi-layered semiconductors used in the manufacturing computers, laptops, music players, phones, servers, and household appliances. The electronic industry is witnessing steady growth in developed and developing countries. The companies operating in this field use photoresist and photoresist ancillaries in products such as advanced telephones, computer systems, and related accessories, televisions and home entertainment equipment, and electronic control and monitoring devices,which have applications in many industrial and scientific areas.

North America Photoresist and Photoresist Ancillaries Market

Market Insights

Growth in semiconductor industry to favor North America photoresist and photoresist ancillaries market

Steady growth in the semiconductor industry is influencing the market for photoresist and photoresist ancillaries globally. For instance, the US has a well-established semiconductor and electronics sector. According to the International Trade Association, the US semiconductor industry generated worldwide sales worth US$166 billion in 2015. The semiconductor and circuit manufacturing sector is among the leading export industries in the US. According to the Semiconductor Industry Association (SIA), the semiconductor industry indirectly provides jobs to over 250,000 Americans. Semiconductors are devices manufactured from materials that conduct under particular conditions, and ICs are known to be the smaller version of circuit boards, which consists of thousands of small electronic components, including capacitors, resistors, and transistors. ICs are used by the manufacturers in numerous electronic devices, such as smart phones, PCs & laptops, mobile devices, tablets, and also in advanced gaming devices. The continuously growing demand for the high component density of electronic devices is expected to fuel the market for photoresist. The higher density of the device can increase its multi-functionality andspeed, as well as reduces its surface area than the previous versions. The products manufactured by the semiconductor industries are used as a major input for other technologies, leading to diversified demand from many markets. The use of semiconductors in a wide range of emerging technologies, such as artificial intelligence and the Internet of Things (IoT), contribute to the growth of the photoresist and photoresist ancillaries market.  

Photoresist Type-Based Market Insights

The North Americaphotoresist and photoresist ancillaries market is segmented based on photoresist type as ArF Immersion Photoresist, ArF Dry Photoresist, KrF Photoresist, and G-line and I-line Photoresist. The ArF immersion photoresist segment holds the largest share of the North America photoresist and photoresist ancillaries market. ArF Immersion Photoresist are defined as the photoresist materials in the 193nm range and are widely used to manufacture products such as smartphones, PCs, automobiles, electrical appliances, and others. They may be categorized by 65 nm/120 nm pitch dense contact hole or 65 nm/180 nm pitch semi-dense contact hole, and 65 nm ISO contact hole. They are considered as an excellent process window displaying critical dimension (CD) uniformity allowing better profile shape of the product. Also, the overall process costs are minimized as the topcoat is used in these materials. Further, they exhibit superior DOF margin, minimal defectivity, and excellent lithography with low Mask Error Enhancement Factor (MEEF). ArF immersion photoresist finds applications in micro and nanometer level processing and provides optimal photoresistsolution for manufacturing several smaller electronic devices with extended functions.

Photoresist Ancillaries Type-Based Market Insights

The remover segment is estimated to grow at the fastest rate in the North America photoresist and photoresist ancillaries market. The edge bead removers are extensively deployed in photolithography mechanism for eliminating the edge bead build-ups at the time of spring coating process. Various industrial capabilities have established integrated edge-bead removal system within their spin stations. These removers are comparatively more effective on multi-layer products thanon the single-layer devices. Edge bead removers are purposely designed to immediately initiate the process of removal by directing a stream of the removers near the edge of the wafer when it is spinning. Under the controlled spin speed and proper handling of edge bead remover’s nozzle position, the resist edge bead is eliminated. Several companies are involved in the manufacturing of a complete line of edge bead remover solutions,which can offer world-class edge bead removal along with ensuring maintenance of the industry standard for purity, packaging, and environmental protection.

Application-Based Market Insights

The North America photoresist and photoresist ancillaries market is segmented into applications as semiconductors & ICs, LCDs, printed circuit boards, and others. The printed circuit boards segmentis estimated to grow at the fastest rate in the North America photoresist and photoresist ancillaries market. Printed circuit boards are widely deployed in the products of communications, information technology, automobiles, semiconductors and other components. Printed circuit boards can be segregated on the basis of materials, process technology, and applications into several products forms such as flexible PCB, rigid PCB, rigid-flexible composite PCB, and IC boards.

Impact of COVID-19 Pandemic on Photoresist and Photoresist Ancillaries Market

The US recorded the highest number of confirmed cases of Covid-19, as compared with Canada and Mexico. This is likely to impact the chemicals industry in the region; due to the COVID-19 outbreak, the supply chain is likely to get affected. In addition, the overall manufacturing processes, research, and development activities will also impact market growth.

US Photoresist and Photoresist Ancillaries Market,by Application

NORTH AMERICA PHOTORESIST AND PHOTORESIST ANCILLARIES MARKET SEGMENTATION

By Photoresist Type

• ArF Immersion Photoresist
• ArF Dry Photoresist
• KrF Photoresist
• G-line and I-line Photoresist

By Photoresist Ancillaries Type

• Anti-reflective Coatings
• Remover
• Developer
• Others

By Application

• Semiconductors and ICs
• LCDs
• Printed Circuit Boards
• Others

Company Profiles

• MERCK KGaA
• Sumitomo Chemical Co., Ltd.
• TOKYO OHKA KOGYO CO., LTD
• Micro Resist Technology GmbH
• Shin-Etsu Chemical Co., Ltd
• DJ Microlaminates, Inc.
• DuPont de Nemours, Inc.
• Fujifilm Corporation
• JSR Corporation

North America Photoresist and Photoresist Ancillaries Report Scope