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North America Photoresist And Photoresist Ancillaries Market Scope And Analysis

  • Report Code : TIPRE00011578
  • Category : Chemicals and Materials
  • Status : Published
  • No. of Pages : 137
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North America Photoresist and Photoresist Ancillaries Market Analysis, Trends, and Scope 2019 to 2027

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North America Photoresist and Photoresist Ancillaries Market Report North America Photoresist and Photoresist Ancillaries Market Size and Share North America Photoresist and Photoresist Ancillaries Market Scope and Analysis

North America Photoresist and Photoresist Ancillaries Market Report Scope

Report Attribute Details
Market size in 2018 US$ 666.7 Million
Market Size by 2027 US$ 1,128.5 Million
Global CAGR (2019 - 2027) 6.0%
Historical Data 2016-2017
Forecast period 2019-2027
Segments Covered By Photoresist Type
  • ArF Immersion Photoresist
  • ArF Dry Photoresist
  • KrF Photoresist
  • G-line and I-line Photoresist
By Photoresist Ancillaries Type
  • Anti-reflective Coatings
  • Remover
  • Developer
By Application
  • Semiconductors and ICs
  • LCDs
  • Printed Circuit Boards
Regions and Countries Covered North America
  • US
  • Canada
  • Mexico
Market leaders and key company profiles
  • MERCK KGaA
  • Sumitomo Chemical Co Ltd
  • TOKYO OHKA KOGYO CO LTD
  • Micro Resist Technology GmbH
  • Shin Etsu Chemical Co Ltd
  • DJ Microlaminates Inc
  • DuPont de Nemours Inc
  • Fujifilm Corporation
  • JSR Corporation
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