光掩模市场基于(关键地区、市场参与者、规模和份额)- 到 2031 年的预测

  • Report Code : TIPTE100000388
  • Category : Electronics and Semiconductor
  • Status : Published
  • No. of Pages : 151
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2018年光掩模市场估值为40.2亿美元,预计到2027年将达到59亿美元;预计 2019-2027 年复合年增长率为 4.5%。

光掩膜是微光刻工艺中使用的一种工艺,用于制造集成电路 (IC)、微机电器件 (MEMS)、半导体、PCB 和光子器件。通常,光掩模被称为图案的母版,因为它的作用就像摄影中的负片。通过光刻工艺,光掩模将图案转移到电路板的基板上。光掩模中的设计由二进制图案组成,该图案复制了需要压印在基板或电路板上的原始设计。光掩模上的二元图案调制光刻过程中的光强度,以将设计打印在所使用的基板或硅晶圆上。光掩模本身采用玻璃基板或熔融石英制成,并涂有不透明薄膜。

电子设备的生命周期短,小存储存储器的存储要求高芯片尺寸是推动光掩模市场增长的几个因素,以及半导体制造业(特别是发展中经济体)越来越多地采用这些工具,从而导致对光掩模的需求增加。许多公司,如 Nippon Filcon Co Ltd、Taiwan Mask Corporation、Hoya Group、Photronics Inc.、Toppan photomasks 等都在投资光掩模,因为光掩模在准确性、运营效率和及时订单履行方面具有潜在的改进,从而帮助他们提高客户保留率并在市场上有效竞争。

移动设备显示从 LCD 向 LED 和 AMOLED 的转变以及物联网概念的渗透不断增加等因素随着新设计需要一套新的光掩模,FPD(平板显示器)和 IC 光掩模的需求。此外,MEMS 系统(微机电)在汽车、消费电子和生物 MEMS 行业的应用也将对新型光掩模产生强劲的需求拉动。掩模复杂性的增加也将推动光掩模市场中每层的掩模层数增加,每层的几何形状更紧密。

光掩模市场的利润丰厚的区域


市场洞察–光掩模市场

使用半导体器件的制造业的增长亚太地区

丰富的人力资源和自然资源使亚太地区成为最理想的制造工厂设立地点之一。亚太地区作为一个以发展中国家为主的地区,在西方影响力的推动下,技术进步正在逐步提速。因此,制造工厂正在寻求传统运营方法的范式转变,以实现更好的成本和运营效率。消费电子、汽车、纺织、消费品等制造业是该行业繁荣的最大贡献者。

制造业中的自动化整合是可能的只能借助高功率半导体和IC芯片。为了满足全球需求,制造工厂的生产能力需要提高,机器中集成的半导体器件的数量也将随之增加。此外,中国、印度、日本和新加坡政府一直通过“印度制造”等计划支持内部制造。此类计划确保大量投资涌入经济。投资使高端技术得以采用。

用于确保这些半导体和 IC 可用性的光掩模工具也将受到高度需求,从而推动光掩模市场的发展随着亚太地区制造业的蓬勃发展。

类型细分洞察

根据类型,光掩模市场分为光罩、母掩模和复制面具。不同类型的光掩模在为 IC 和其他半导体芯片的生产提供帮助方面发挥着重要作用。此外,为了量产TFT-LCD面板的TFT阵列和彩色滤光片,光刻技术将光掩模图形转移到LCD面板的基材上。

应用细分市场洞察

根据应用,光掩模市场分为半导体和集成电路、分立器件、光电器件、显示器件、MEMS等。光掩模最大的应用是半导体制造。生产完整的半导体材料需要一套光掩模。在这种情况下,光掩模受到称为薄膜的箔的保护,以避免对芯片板造成任何污染。然后通过激光光刻或电子束光刻将刻在光掩模上的图像压印在芯片板上。

最终用户垂直细分市场洞察

根据应用,光掩模市场分为半导体和光掩模市场。 IC和平板显示器。光掩模最大的应用是半导体制造。根据俄亥俄州的研究,近 90% 的家用设备是通过硅晶圆制造的,而 30% 的不同玩具和 45% 的工业机器是通过硅晶圆开发和制造的。上述大量申请,清晰地描绘了全球硅片销量的激增。因此,为了成功及时满足全球多元化市场的需求,晶圆制造工艺正在不断提升,预计也将渗透到光掩模市场。

战略洞察

市场参与者专注于新产品创新和开发,通过在其产品中集成先进技术和功能来与竞争对手竞争。

2019:Photronics, Inc. 开设了两个新的 IC 制造工厂以及中国的FPD。该公司投资约 3.2 亿美元来建立这些设施。这些工厂致力于光掩模在中国的研发、制造和销售。
2018年:凸版光掩模对现有的上海凸版光掩模有限公司进行了追加投资,用于大规模生产先进的光掩模。
2017年:DNP与Photronics, Inc.成立合资企业,为中国半导体制造商提供服务。根据协议,DNP子公司将收购该公司在华全资子公司49.99%的股权,组建厦门光电子DNP掩模有限公司(PDMCX)。 Photronics 将保留新公司 50.01% 的所有权。

全球光掩模市场细分如下:

 

光掩模市场——按类型

  • 光罩
  • 母版掩模
  • 复制掩模

光掩模市场按应用划分

  • 半导体和 IC
  •  分立器件、光电器件
  •  显示器件
  • MEMS
  • 其他

光掩模市场——按最终用户行业划分

  • 半导体与半导体IC
  • 平板显示器

光掩模市场 -按地理位置

  • 北美洲
    • 美国
    • 加拿大
    • 墨西哥
  • < li>欧洲
    • 法国
    • 德国
    • 意大利
    • 英国
    • 俄罗斯
    • 其他欧洲
  • 亚太地区 (APAC)
    • 中国
    • 印度
    • 韩国
    • 日本
    • 亚太地区其他地区
  • 中东和中东地区非洲 (MEA)
    • 南非
    • MEA 其余地区
  • 南美洲 (SAM)
    • 巴西< /li>
    • 阿根廷
    • SAM 的其他地区

光掩模市场  公司简介

  • Advance Represents Corporation
  • Compugraphics International Limited
  • 大日本印刷株式会社
  • HOYA Corporation< /li>
  • LG Innotek 有限公司
  • Nippon Filcon 有限公司
  • Photronics, Inc.
  • SK-Electronics 有限公司, 股份有限公司
  • 台湾掩模股份有限公司(TMC)
  • 凸版印刷股份有限公司
  •  
Report Coverage
Report Coverage

Revenue forecast, Company Analysis, Industry landscape, Growth factors, and Trends

Segment Covered
Segment Covered

This text is related
to segments covered.

Regional Scope
Regional Scope

North America, Europe, Asia Pacific, Middle East & Africa, South & Central America

Country Scope
Country Scope

This text is related
to country scope.

The List of Companies

  1. Nippon Filcon Co Ltd.
  2. Taiwan Mask Corporation
  3. Hoya Group
  4.  Photronics Inc.
  5. Toppan photomasks
  6. Dai Nippon Printing Co. Ltd.
  7. Advance Reproductions
  8. SK-Electronics
  9. Compugraphics
  10. LG Innotek

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